The big joke about extreme ultraviolet (EUV) technology is that it takes seven trucks to deliver the mammoth tools compared to one for other advanced lithography tools — but actually, this is no joke.

BELMONT, Calif.--(BUSINESS WIRE)--Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the ...

Pattern-shaping technology: a breakthrough innovation for the patterning engineer's toolkit. Applied Materials’ pattern-shaping technology brings an entirely new capability to chipmakers, enabling ...

According to Applied Materials, it is. As 32 nm technologies ramp within the next two years, the extension of optical lithography to meet patterning requirements is the industry’s most urgent ...

As the unstoppable progression of Moore’s law has driven the semiconductor technology roadmap farther and farther below 1 µm, a steady stream of engineering marvels has been required to produce ...

Applied Materials, Inc. (AMAT), a semiconductor equipment manufacturer (“semi cap”), announced Centura Sculpta last week. According to the company, this tool will help semiconductor manufacturers ...

Scanner resolution improvements have diminished since the 193-nm wavelength became commonplace. Today’s technologies are sufficient for 28-nm IC designs using immersion, but not beyond without ...

In the creative, or desperate, rush to find ways to pattern 10 nm node using double patterning immersion 193nm lithography, a designer from ARM is left “crying in his beer” at the consequent design ...

Cadence Design Systems is targeting designs for the 20nm process node with its latest tools in the Virtuoso suite. Called Virtuoso Advanced Node, the mixed signal chip design tool addresses 20nm ...

Double patterning looks like being the lithography tool of choice at 32nm, but how do you absorb the inevitable extra costs of a double lithography process? According to Applied Materials, the world’s ...

MILPITAS, Calif., May 31, 2012 -- At next week's Design Automation Conference (DAC) in San Francisco, Calif., GLOBALFOUNDRIES plans to demonstrate an enhanced silicon-validated design flow for its ...

In the famous double-slit experiment, an interference pattern consisting of dark and bright bands emerges when a beam of light hits two narrow slits. The same effect has also been seen with particles ...